Conical Flask

Isi ihe: 99.99% dị elu{1}} quartz fused dị ọcha (SiO₂)
Ọkwa adịghị ọcha:<5ppm metallic contaminants (Fe, Al, Na, etc.)
Ọdịnaya OH:<10ppm (low-hydroxyl grade available)
Nkwụsi ike nke thermal: Ebe dị nro na ogo 1680

Zipu ozi

Nkọwa

Atụmatụ igodo

Nguzogide kemịkalụ:

- Inert na acids (belụsọ HF), alkalis, na ihe mgbaze organic

- Ọ dịghị leaching ma ọ bụ mmetọ nke samples nwere mmetụta

Arụmọrụ okpomọkụ:

- Na-eguzogide okpomọkụ site na -200 degrees ruo 1100 degrees

- Resistant to thermal shock (ΔT >800 degrees)

Nchapụta anya:

- >90% ìhè nnyefe (190nm-2500nm)

- dị mma maka mmeghachi omume UV{1}

Nhazi nkenke:

- Ọkpụrụkpụ mgbidi enyi (±0.2mm)

- Ọkọlọtọ nkwonkwo iko ala (24/29, 19/22, wdg)

- Akara ndị gụsịrị akwụkwọ dị (nnwere onwe klas A)

Ihe mejupụtara

Ihe nke izizi:99.99% dị elu{1}} quartz fused dị ọcha (SiO₂)
Ọkwa adịghị ọcha: <5ppm metallic contaminants (Fe, Al, Na, etc.)
Ọdịnaya OH: <10ppm (low-hydroxyl grade available)
Nkwụsi ike okpomọkụ:Ebe nro na 1680 degrees

Ngwa

Ngwakọta kemịkalụ:

- Ntughari, ntughari, na kristal

Mgbari acid dị ọcha - dị elu{{1}

Ngwa ahịa ọgwụ:

- Mmepe mmepụta ọgwụ

- Nkwadebe ngwọta adịghị mma

Ụlọ ọrụ Semiconductor:

- Usoro nhicha wafer

Ijikwa kemịkal dị ọcha - dị elu{{1}

Ụlọ akwụkwọ agụmakwụkwọ na nyocha:

Nzaghachi ebumnuche - izugbe{1}

- Ngosipụta nkuzi

Ogo a na-ahụkarị

Olu/ml	Dayameta dị n'elu maka olu / mm	Dayameta dị n'elu maka ahụ/mm	Ogologo zuru oke/mm	Obere mgbidi ọkpụrụkpụ/mm
25	22	42	70	0.8
50	22	51	85	0.8
100	22	64	105	0.8
250	34	85	140	0.9
500	34	105	175	0.9
1000	42	131	220	1.3
2000	50	168	280	1.5
3000	50	187	310	1.8
5000	50	220	365	1.8